This volume outlines the physical and methodical concepts ofX-ray photoelectron spectroscopy (XPS) specifically for surface studiesusing both inner and valence electron levels.
It discusses the theory and practice of XPS qualitative and quantitativeanalysis of solid state surfaces and provides lists of extendedexperimental and theoretical data necessary for the determination ofconcentration and thin film thicknesses. In addition it covers the manyproblems concerning in-depth profiling, ion sputtering rate and damagesof the structure of altered layers, as well as applications of angulardependence of the intensities and photoelectron diffraction for surfacestudies. Also provided are the applications of XPS for theinvestigations of catalysts, adsorption, electronic surface states,oxydation of semi-conductors and alloys, minerals, including lunarregolith and natural gold, glasses, radiation damage, surface diffusion,polymers, etc.
It will be of value to academic and industrial researchers in theirpractical application of XPS and the results gained from it.
1988; viii+200 pages ISBN 90-6764-080-8 Price (all prices are subject to change without notice): EUR 127/US$ 182
