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Editor: K.L. Mittal
This volume documents the proceedings of the InternationalSymposium on Surface Contamination and Cleaning, held in Newark, NewJersey, May 23-25, 2001.
Because of the importance of this topic in many technological areas,tremendous efforts have been devoted to devise novel and more efficientways to monitor, analyse and characterize contamination on surfaces aswell as ways to remove such contamination from a wide variety ofsurfaces. The technological areas where surface contamination has alwaysbeen a bete noire and thus surface cleaning is of cardinalimportance are too many and range from aerospace to microelectronics tobiomedical.
This volume contains a total of 24 papers, all rigorously peer reviewedand revised before inclusion, which deal with all kinds ofcontaminations on a host of surfaces. The topics covered include:mapping of surface contaminants; various techniques for cleaningsurfaces; various techniques for monitoring level of cleanliness;acceptable cleanliness levels; ionic contamination; pharmaceuticalcleaning validations; cleaning of glass surfaces; decontamination ofsensitive equipment; no-chemistry process cleaning; waterjet cleaning;cleaning with solid carbon dioxide pellet blasting; cleanroom wipers;dust removal from solar panels and spacecraft on Mars; laser cleaning ofsilicon surfaces; particle removal; implications of surfacecontamination and cleaning; and future of industrial cleaning andrelated public policy-making.
This volume offers a wealth of information and represents currentcommentary on the R&D activity taking place in the technologicallyhighly important field of surface contamination and cleaning and shouldbe of value and interest to anyone interested in the fundamental orapplied aspects of this topic.
2003; x+364 pages
ISBN 90-6764-376-9
Price (all prices are subject to change without notice): EUR 194/US$ 277
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