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Editor: K.L. Mittal
This volume documents the proceedings of the 7thInternationalSymposium on Particles on Surfaces: Detection, Adhesion and Removalheld in Newark, NJ, June 19-21, 2000. The study of particles on surfacesis extremely important in a host of diverse technological areas, rangingfrom microelectronics to optics to biomedical.
This volume contains a total of 28 papers, which were all properly peerreviewed, revised and edited before inclusion. Therefore, this book isnot merely a collection of unreviewed manuscripts, but rather representsinformation which has passed peer scrutiny. Furthermore, the authorswere asked to update their manuscripts, so the information contained inthis book should be current and fresh.
This volume is divided into two parts: 1) Particle Analysis and GeneralCleaning-Related Topics; and 2) Particle Adhesion and Removal. Thetopics covered include: surface analysis techniques for particleidentification; cleaning, rinsing and drying issues in post-CMPcleaning; fundamental forces involved in particle adhesion; factorsaffecting adhesion of small (nanosize) particles; factors important inparticle detachment; particle adhesion measurement by AFM; various (wetand dry) techniques for particle removal, e.g., laser, ultrasonic,megasonic, use of surfactants; toner particles and pharmaceuticalparticles.
This volume offers a wealth of information on the tremendouslytechnologically important field of particles on surfaces and shouldprovide a consolidated source of current R&D activity in this arena.Therefore, it will be of value and use to anyone interested in the topicof particles on surfaces.
2002; x+470 pages
ISBN 90-6764-372-6
Price (all prices are subject to change without notice): EUR 217/US$ 310
VSPPostal address: P.O. Box 9000, 2300 PA Leiden, The Netherlands